Author(s)
Yaw Obeng, Elisabeth Mansfield, Albert Davydov, Bryan Barnes, Andras Vladar
Abstract
The Metrology Chapter identifies emerging measurement challenges from devices, systems, and integration of new materials in the semiconductor industry and describes research and development pathways for meeting them. This includes but not limited to, measurement needs for extending CMOS, accelerating beyond CMOS technologies, novel communication devices, sensors, and transducers, materials characterization, and structure-function relationships. This also includes advances in metrology required for research and development, and process control in manufacturing environments This metrology roadmap addresses some of the measurement science challenges to enable the realization of new metrology developments and aims to provide a long-term view of the challenges, potential solutions, technology, tools, and infrastructure needed to characterize new devices and materials for process control, and manufacturability. The information outlined in this chapter could serve as a guide for metrologists, equipment manufacturers, and researchers. It can also serve as an input for standards organizations to develop solutions for key measurement challenges where the adoption of a standard or benchmark would help advance technology.
Citation
International Roadmap for Devices and Systems (IRDS™) 2024 Edition
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Technology commercialization, Process measurement and control and Process improvement
Citation
Obeng, Y. , Mansfield, E. , Davydov, A. , Barnes, B. and Vladar, A. (2025), INTERNATIONAL ROADMAP FOR DEVICES AND SYSTEMS TM 2024 METROLOGY, International Roadmap for Devices and Systems (IRDS™) 2024 Edition, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=959302, https://irds.ieee.org/editions/2024 (Accessed July 10, 2025)
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